APPLICATION OF EQUIPMENT FOR AUTOMATIC CONTROL OF PLANAR STRUCTURES IN MANUFACTURING MASTER MASKS OF INTEGRATED CIRCUITS ON PHOTO-MASKS
Abstract
Following the concept of defect-free manufacturing of master masks of IC on photo-masks, two Belarusian sets of optomechanical equipment for 0,3 5 p and 90 nanometers are presented in the paper. Each of the sets comprises:
• Multi-channel laser pattern generator;
• Automatic mask defect inspection system;
• Laser-based mask defect repair system.
The paper contains description of automatic mask defect inspection process during photo-mask manufacturing and respective basic technological operations of the processes.
Advantages of a complex approach to the development of a set of opto-mechanical equipment for defect-free manufacturing of photo-masks have been analyzed in the paper.
References
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Review
For citations:
Avakov S.M. APPLICATION OF EQUIPMENT FOR AUTOMATIC CONTROL OF PLANAR STRUCTURES IN MANUFACTURING MASTER MASKS OF INTEGRATED CIRCUITS ON PHOTO-MASKS. Science & Technique. 2007;(6):64-70. (In Russ.)
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