satНАУКА и ТЕХНИКАScience & Technique2227-10312414-0392Belarusian National Technical Universitysat-1148Research ArticleПРИБОРОСТРОЕНИЕ. ИНФОРМАТИКАINSTRUMENT ENGINEERING. INFORMATICSПРИМЕНЕНИЕ ОБОРУДОВАНИЯ ДЛЯ АВТОМАТИЧЕСКОГО КОНТРОЛЯ ПЛАНАРНЫХ СТРУКТУР В ПРОИЗВОДСТВЕ ОРИГИНАЛОВ ТОПОЛОГИИ ИНТЕГРАЛЬНЫХ СХЕМ НА ФОТОШАБЛОНАХAPPLICATION OF EQUIPMENT FOR AUTOMATIC CONTROL OF PLANAR STRUCTURES IN MANUFACTURING MASTER MASKS OF INTEGRATED CIRCUITS ON PHOTO-MASKSАваковС. М.AvakovS. M.

Лауреат Государственной премии Республики Беларусь, кандидат технических наук

sat@bntu.byКБТЭМ-ОМО ГНПО «Планар»БеларусьPlanarBelarus200708122007066470Copyright © Аваков С.М., 20072007Аваков С.М.Avakov S.M.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://sat.bntu.by/jour/article/view/1148

В соответствии с концепцией бездефектного изготовления оригиналов топологии интегральных схем на фотошаблонах представлены два отечественных комплекта оптико-механического оборудования, предназначенные для реализации технологии 0,35 мкм и 90 нм. Каждый из этих комплектов состоит из: • многоканального лазерного генератора изображений; • установки автоматического контроля топологии фотошаблонов; • установки лазерного устранения дефектов топологии фотошаблонов.

Приводится описание операции автоматического контроля топологии в технологическом процессе изготовления фотошаблонов и краткое описание базовых технологических операций этого процесса.

Анализируются преимущества комплексного подхода к проблеме разработки комплекта оптико-механического оборудования для бездефектного изготовления фотошаблонов.

Following the concept of defect-free manufacturing of master masks of IC on photo-masks, two Belarusian sets of optomechanical equipment for 0,3 5 p and 90 nanometers are presented in the paper. Each of the sets comprises:   • Multi-channel laser pattern generator; • Automatic mask defect inspection system; • Laser-based mask defect repair system.

The paper contains description of automatic mask defect inspection process during photo-mask manufacturing and respective basic technological operations of the processes.

Advantages of a complex approach to the development of a set of opto-mechanical equipment for defect-free manufacturing of photo-masks have been analyzed in the paper. 

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The authors declare that there are no conflicts of interest present.