METHODS FOR OBTAINING SUB-PIXEL RESOLUTION DURING AUTOMATIC INSPECTION OF PATTERN MASTER MASKS OF INTEGRATED CIRCUITS
Abstract
The paper reveals significance and complexity of automatic inspection of pattern master masks of integrated circuits under conditions of continuous decrease of topological design specifications. Two methods for obtaining sub-pixel resolution are presented in the paper. The first method is based on new virtual scanning algorithms ensuring optimal alignment of the discreet grid of the automatic pattern inspection system with a coordinate grid of a topological pattern to be inspected. The second method is based on the application of a new method for automatic inspection of master pattern masks of Very Large Scale Integrated Circuits on photo-masks. The first method allows to obtain universal algorithms with sub-pixel resolution by 20–30 % less than the pixel size. The second method allows to obtain object-oriented algorithms with sub-pixel resolution that is significantly less pixel rate. It is shown that, for example, for the pattern of «contact window» type a sub-pixel resolution may achieve 3 % of the pixel size
About the Author
S. M. Avakov
Научно-производственное республиканское унитарное предприятие «КБТЭМ-ОМО»
Belarus
Belarus
References
1. Results from a new die-to-database reticle inspection platform / W. Broadbent [et al.] // Metrology, Inspection, and Process Control for Microlithography XXI, Chas N. Archie, Ed., Proc. of SPIE. – 2007. – Vol. 6518. – P. 1–14.
2. A complete set of the special process equipment for the defect-free production of reticles / S. Avakaw [et al.] // The 23rd European Mask and Lithography Conference EMLC-2007. Janyary 22–25, 2007. – Grenoble, France. – P. 29–30.
3. Alfred, Kwok-Kit Wong. Resolution Enhancement Techniques in Optical Lithography / Alfred Kwok-Kit Wong // SPIE PRESS, USA. – 2001. – Р. 1–213.
4. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography / Masaki Yoshizawa [et al.] // Bacus News. –2006. – Vol. 22, Issue 8.– Р. 1–11.
5. Evaluation of quartz dry etching profilr for the PSM lithography performance / K. Toro [et al.] // Bacus News. – 2006. – Vol. 22, Issue 1. – P. 1–15.
6. Uwe, Behringer. Foreword of the 19th European Mask Conference on Mask Technology for Integrated Circuts and Micro-Components / Behringer Uwe // Lectures held at the GMM-Conference. January 13–15, 2003 in Sonthofen, Germany. – P. 1–2.
7. Avakaw, S. M. Semi-transparent Isolated defects detection by die-to-database mask Inspection using virtual scanning algorithms for sub-pixel resolution / S. M. Avakaw // EMC-2004, January 12–14, 2004, Dresden, Germany – GMM Fachbericht 43, VDE Verlag. – P. 43–52.
8. Способ контроля дефектов первичных шаблонов : пат. 8893, РБ. – № а 20040821 ; приоритет 31.08.2004 / А. И. Корнелюк, С. М. Аваков.
9. Способ контроля дефектов первичных шаблонов : пат. 9175, РБ. – № а 20040985 ; приоритет 26.10.2004 / А. И. Корнелюк, С. М. Аваков.
10. Avakaw, S. M. Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects / S. M. Avakaw // EMC-2003, January 13–15, 2003, Sonthofen, Germany – GMM Fachbericht 39, VDE Verlag. – P. 179–187.
11. Multi-beam high resolution die-to-database reticle inspection / W. W. Volk [et al.] // EMC-2002, January 15–16, 2002, Munich, Germany – GMM Fachbericht 36, VDE Verlag. – P. 163–173.
12. Avakaw, S. High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform / S. Avakaw // SPIE. – 2005. – Vol. 5835. – P. 290–299.
Review
For citations:
Avakov S.M. METHODS FOR OBTAINING SUB-PIXEL RESOLUTION DURING AUTOMATIC INSPECTION OF PATTERN MASTER MASKS OF INTEGRATED CIRCUITS. Science & Technique. 2008;(1):44-49. (In Russ.)
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